A robust AFM-based method for locally measuring the elasticity of samples

• Alexandre Bubendorf,
• Stefan Walheim,
• Thomas Schimmel and
• Ernst Meyer

Beilstein J. Nanotechnol. 2018, 9, 1–10, doi:10.3762/bjnano.9.1

• ) of 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) on a silicon oxide (SiOx) substrate were investigated. The SAM was prepared with circular holes obtained by polymer blend lithography (PBL) [24]. A reference sample consisting of polytetrafluoroethylene (PTFE), commonly called Teflon, with a nominal

Polymer blend lithography for metal films: large-area patterning with over 1 billion holes/inch²

• Cheng Huang,
• Alexander Förste,
• Stefan Walheim and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2015, 6, 1205–1211, doi:10.3762/bjnano.6.123

• , Germany 10.3762/bjnano.6.123 Abstract Polymer blend lithography (PBL) is a spin-coating-based technique that makes use of the purely lateral phase separation between two immiscible polymers to fabricate large area nanoscale patterns. In our earlier work (Huang et al. 2012), PBL was demonstrated for the

• ][39]. Conclusion Polymer blend lithography (PBL) makes use of the purely lateral phase separation of two immiscible polymers during spin-casting at controlled humidity. A metal copy of either of the polymer components can be fabricated by the selective dissolution of one component, followed by metal

Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

• Cheng Huang,
• Markus Moosmann,
• Jiehong Jin,
• Tobias Heiler,
• Stefan Walheim and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2012, 3, 620–628, doi:10.3762/bjnano.3.71

• (KIT), 76128 Karlsruhe, Germany Joint Research Laboratory Nanomaterials Karlsruhe Institute of Technology (KIT)/Darmstadt University of Technology, 64287 Darmstadt, Germany 10.3762/bjnano.3.71 Abstract A rapid and cost-effective lithographic method, polymer blend lithography (PBL), is reported to

• growth of ZnO nanostructures [1]. Keywords: breath figure; nanopatterned template; polymer blend lithography (PBL); self-assembled monolayer (SAM); self assembly; spin coating; vapor phase; Introduction Self-assembled monolayers (SAMs) are well-known and have been intensively studied for many years

• surfaces. Conclusion Polymer-blend lithography (PBL) makes use of lateral structure formation during the spin-coating process of a polymer-blend film. The structures are transformed into a patterned SAM with two or three different chemical functionalities by a lift-off process. PBL starts with spin-casting